Friction-induced selective etching on silicon by TMAH solution

Friction-induced selective etching provides a new thought direction in the field of nanotechnology with high resolution, low cost, flexibility and site control. In this work, it was found that the scratched area on a silicon surface can play a role as a mask against etching in tetramethyl ammonium h...

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Detalles Bibliográficos
Autores principales: Zhou, Chao, Li, Jiaming, Wu, Lei, Guo, Guangran, Wang, Hongbo, Chen, Peng, Yu, Bingjun, Qian, Linmao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9088682/
https://www.ncbi.nlm.nih.gov/pubmed/35558468
http://dx.doi.org/10.1039/c8ra07064d

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9088682/
https://www.ncbi.nlm.nih.gov/pubmed/35558468
http://dx.doi.org/10.1039/c8ra07064d

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