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Friction-induced selective etching on silicon by TMAH solution
Friction-induced selective etching provides a new thought direction in the field of nanotechnology with high resolution, low cost, flexibility and site control. In this work, it was found that the scratched area on a silicon surface can play a role as a mask against etching in tetramethyl ammonium h...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9088682/ https://www.ncbi.nlm.nih.gov/pubmed/35558468 http://dx.doi.org/10.1039/c8ra07064d |