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Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study
We investigated the overall ALD reaction mechanism for W deposition on TiN surfaces based on DFT calculation as well as the detailed dissociative reactions of WF(6). Our calculated results suggest that the overall reactions of the WF(6) on the B-covered TiN surfaces are energetically much more favor...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9090620/ https://www.ncbi.nlm.nih.gov/pubmed/35558318 http://dx.doi.org/10.1039/c8ra07354f |