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Highly Sensitive Photopolymer for Holographic Data Storage Containing Methacryl Polyhedral Oligomeric Silsesquioxane

[Image: see text] Herein, via introducing eight methacryl polyhedral oligomeric silsesquioxane (Ma-POSS), we dramatically enhance the holographic performance of phenanthraquinone-doped poly(methyl methacrylate) (PQ/PMMA) photopolymer with excellent characteristics of high sensitivity, high diffracti...

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Detalles Bibliográficos
Autores principales: Hu, Po, Li, Jinhong, Jin, Junchao, Lin, Xiao, Tan, Xiaodi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9100513/
https://www.ncbi.nlm.nih.gov/pubmed/35486469
http://dx.doi.org/10.1021/acsami.2c04011