Cargando…
Deep Etching of Silicon Based on Metal-Assisted Chemical Etching
[Image: see text] A deep etching method for silicon “micro”structures was successfully developed. This wet etching process is based on metal-assisted chemical etching (MACE), which was previously mainly utilized to etch the features that have lateral dimensions of “nanometers.” In this novel MACE, t...
Autores principales: | , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2022
|
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9118418/ https://www.ncbi.nlm.nih.gov/pubmed/35601341 http://dx.doi.org/10.1021/acsomega.2c01113 |
_version_ | 1784710490781384704 |
---|---|
author | Nur’aini, Anafi Oh, Ilwhan |
author_facet | Nur’aini, Anafi Oh, Ilwhan |
author_sort | Nur’aini, Anafi |
collection | PubMed |
description | [Image: see text] A deep etching method for silicon “micro”structures was successfully developed. This wet etching process is based on metal-assisted chemical etching (MACE), which was previously mainly utilized to etch the features that have lateral dimensions of “nanometers.” In this novel MACE, the critical improvement was to promote the “out-of-plane” mass transfer at the metal/Si interface with an ultrathin metal film. This enabled us to etch micrometer-wide holes, which was previously challenging due to the mass transport limitation. In addition, it was found that when ethanol was used as a solvent instead of water, the formation of porous defects was suppressed. Under the optimized etch conditions, deep (>200 μm) and vertical (>88°) holes could be carved out at a fast etch rate (>0.4 μm/min). This novel deep MACE will find utility in applications such as microelectromechanical systems (MEMS) devices or biosensors. |
format | Online Article Text |
id | pubmed-9118418 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | American Chemical Society |
record_format | MEDLINE/PubMed |
spelling | pubmed-91184182022-05-20 Deep Etching of Silicon Based on Metal-Assisted Chemical Etching Nur’aini, Anafi Oh, Ilwhan ACS Omega [Image: see text] A deep etching method for silicon “micro”structures was successfully developed. This wet etching process is based on metal-assisted chemical etching (MACE), which was previously mainly utilized to etch the features that have lateral dimensions of “nanometers.” In this novel MACE, the critical improvement was to promote the “out-of-plane” mass transfer at the metal/Si interface with an ultrathin metal film. This enabled us to etch micrometer-wide holes, which was previously challenging due to the mass transport limitation. In addition, it was found that when ethanol was used as a solvent instead of water, the formation of porous defects was suppressed. Under the optimized etch conditions, deep (>200 μm) and vertical (>88°) holes could be carved out at a fast etch rate (>0.4 μm/min). This novel deep MACE will find utility in applications such as microelectromechanical systems (MEMS) devices or biosensors. American Chemical Society 2022-05-02 /pmc/articles/PMC9118418/ /pubmed/35601341 http://dx.doi.org/10.1021/acsomega.2c01113 Text en © 2022 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by-nc-nd/4.0/Permits non-commercial access and re-use, provided that author attribution and integrity are maintained; but does not permit creation of adaptations or other derivative works (https://creativecommons.org/licenses/by-nc-nd/4.0/). |
spellingShingle | Nur’aini, Anafi Oh, Ilwhan Deep Etching of Silicon Based on Metal-Assisted Chemical Etching |
title | Deep Etching of Silicon Based on Metal-Assisted Chemical
Etching |
title_full | Deep Etching of Silicon Based on Metal-Assisted Chemical
Etching |
title_fullStr | Deep Etching of Silicon Based on Metal-Assisted Chemical
Etching |
title_full_unstemmed | Deep Etching of Silicon Based on Metal-Assisted Chemical
Etching |
title_short | Deep Etching of Silicon Based on Metal-Assisted Chemical
Etching |
title_sort | deep etching of silicon based on metal-assisted chemical
etching |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9118418/ https://www.ncbi.nlm.nih.gov/pubmed/35601341 http://dx.doi.org/10.1021/acsomega.2c01113 |
work_keys_str_mv | AT nurainianafi deepetchingofsiliconbasedonmetalassistedchemicaletching AT ohilwhan deepetchingofsiliconbasedonmetalassistedchemicaletching |