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Deep Etching of Silicon Based on Metal-Assisted Chemical Etching
[Image: see text] A deep etching method for silicon “micro”structures was successfully developed. This wet etching process is based on metal-assisted chemical etching (MACE), which was previously mainly utilized to etch the features that have lateral dimensions of “nanometers.” In this novel MACE, t...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2022
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9118418/ https://www.ncbi.nlm.nih.gov/pubmed/35601341 http://dx.doi.org/10.1021/acsomega.2c01113 |