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High-throughput growth of HfO(2) films using temperature-gradient laser chemical vapor deposition
The use of hafnia (HfO(2)) has facilitated recent advances in high-density microchips. However, the low deposition rate, poor controllability, and lack of systematic research on the growth mechanism limit the fabrication efficiency and further development of HfO(2) films. In this study, the high-thr...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9125986/ https://www.ncbi.nlm.nih.gov/pubmed/35685177 http://dx.doi.org/10.1039/d2ra01573k |