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High-throughput growth of HfO(2) films using temperature-gradient laser chemical vapor deposition

The use of hafnia (HfO(2)) has facilitated recent advances in high-density microchips. However, the low deposition rate, poor controllability, and lack of systematic research on the growth mechanism limit the fabrication efficiency and further development of HfO(2) films. In this study, the high-thr...

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Detalles Bibliográficos
Autores principales: Tu, Rong, Liu, Ziming, Wang, Chongjie, Lu, Pengjian, Guo, Bingjian, Xu, Qingfang, Li, Bao-Wen, Zhang, Song
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9125986/
https://www.ncbi.nlm.nih.gov/pubmed/35685177
http://dx.doi.org/10.1039/d2ra01573k