Photolithographic realization of target nanostructures in 3D space by inverse design of phase modulation

The mass production of precise three-dimensional (3D) nanopatterns has long been the ultimate goal of fabrication technology. While interference lithography and proximity-field nanopatterning (PnP) may provide partial solutions, their setup complexity and limited range of realizable structures, resp...

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Detalles Bibliográficos
Autores principales: Nam, Sang-Hyeon, Kim, Myungjoon, Kim, Nayoung, Cho, Donghwi, Choi, Myungwoo, Park, Jun Hyung, Shin, Jonghwa, Jeon, Seokwoo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2022
Materias:
Physical and Materials Sciences
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9132447/
https://www.ncbi.nlm.nih.gov/pubmed/35613258
http://dx.doi.org/10.1126/sciadv.abm6310

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9132447/
https://www.ncbi.nlm.nih.gov/pubmed/35613258
http://dx.doi.org/10.1126/sciadv.abm6310

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