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Photolithographic realization of target nanostructures in 3D space by inverse design of phase modulation
The mass production of precise three-dimensional (3D) nanopatterns has long been the ultimate goal of fabrication technology. While interference lithography and proximity-field nanopatterning (PnP) may provide partial solutions, their setup complexity and limited range of realizable structures, resp...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Association for the Advancement of Science
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9132447/ https://www.ncbi.nlm.nih.gov/pubmed/35613258 http://dx.doi.org/10.1126/sciadv.abm6310 |