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Electrical and Thermal Characteristics of AlGaN/GaN HEMT Devices with Dual Metal Gate Structure: A Theoretical Investigation

The electrical and thermal characteristics of AlGaN/GaN high-electron mobility transistor (HEMT) devices with a dual-metal gate (DMG) structure are investigated by electrothermal simulation and compared with those of conventional single-metal gate (SMG) structure devices. The simulations reveal that...

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Detalles Bibliográficos
Autores principales: Qu, Yongfeng, Deng, Ningkang, Yuan, Yuan, Hu, Wenbo, Liu, Hongxia, Wu, Shengli, Wang, Hongxing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9181770/
https://www.ncbi.nlm.nih.gov/pubmed/35683115
http://dx.doi.org/10.3390/ma15113818
Descripción
Sumario:The electrical and thermal characteristics of AlGaN/GaN high-electron mobility transistor (HEMT) devices with a dual-metal gate (DMG) structure are investigated by electrothermal simulation and compared with those of conventional single-metal gate (SMG) structure devices. The simulations reveal that the DMG structure devices have a 10-percent higher transconductance than the SMG structure devices when the self-heating effect is considered. In the meantime, employing the DMG structure, a decrease of more than 11% in the maximum temperature rise of the devices can be achieved at the power density of 6 W/mm. Furthermore, the peak in heat generation distribution at the gate edge of the devices is reduced using this structure. These results could be attributed to the change in the electric field distribution at the gate region and the suppression of the self-heating effect. Therefore, the electrical and thermal performances of AlGaN/GaN HEMT devices are improved by adopting the DMG structure.