Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors

This study presents the construction and dielectric properties investigation of atomic-layer-deposition Al(2)O(3)/TiO(2)/HfO(2) dielectric-film-based metal–insulator–metal (MIM) capacitors. The influence of the dielectric layer material and thickness on the performance of MIM capacitors are also sys...

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Detalles Bibliográficos
Autores principales: Xiong, Li, Hu, Jin, Yang, Zhao, Li, Xianglin, Zhang, Hang, Zhang, Guanhua
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227371/
https://www.ncbi.nlm.nih.gov/pubmed/35745073
http://dx.doi.org/10.3390/molecules27123951

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227371/
https://www.ncbi.nlm.nih.gov/pubmed/35745073
http://dx.doi.org/10.3390/molecules27123951

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