Cargando…
Dielectric Properties Investigation of Metal–Insulator–Metal (MIM) Capacitors
This study presents the construction and dielectric properties investigation of atomic-layer-deposition Al(2)O(3)/TiO(2)/HfO(2) dielectric-film-based metal–insulator–metal (MIM) capacitors. The influence of the dielectric layer material and thickness on the performance of MIM capacitors are also sys...
Autores principales: | Xiong, Li, Hu, Jin, Yang, Zhao, Li, Xianglin, Zhang, Hang, Zhang, Guanhua |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227371/ https://www.ncbi.nlm.nih.gov/pubmed/35745073 http://dx.doi.org/10.3390/molecules27123951 |
Ejemplares similares
-
Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials
por: Cheng, Yi-Lung, et al.
Publicado: (2023) -
High-Performance MIM Capacitors for a Secondary Power Supply Application
por: Mu, Jiliang, et al.
Publicado: (2018) -
Dielectric Property and Breakdown Strength Performance of Long-Chain Branched Polypropylene for Metallized Film Capacitors
por: Xiao, Meng, et al.
Publicado: (2022) -
Hybrid Silicon Substrate FinFET-Metal Insulator Metal (MIM) Memristor Based Sense Amplifier Design for the Non-Volatile SRAM Cell
por: Priya, G. Lakshmi, et al.
Publicado: (2023) -
Dielectric Enhancement of Atomic Layer-Deposited Al(2)O(3)/ZrO(2)/Al(2)O(3) MIM Capacitors by Microwave Annealing
por: Zhu, Bao, et al.
Publicado: (2019)