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Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
To enable a-SiC(x):H-based memristors to be integrated into brain-inspired chips, and to efficiently deal with the massive and diverse data, high switching uniformity of the a-SiC(0.11):H memristor is urgently needed. In this study, we introduced a TiSbTe layer into an a-SiC(0.11):H memristor, and s...
Autores principales: | , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227692/ https://www.ncbi.nlm.nih.gov/pubmed/35745449 http://dx.doi.org/10.3390/nano12122110 |
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author | Chen, Liangliang Ma, Zhongyuan Leng, Kangmin Chen, Tong Hu, Hongsheng Yang, Yang Li, Wei Xu, Jun Xu, Ling Chen, Kunji |
author_facet | Chen, Liangliang Ma, Zhongyuan Leng, Kangmin Chen, Tong Hu, Hongsheng Yang, Yang Li, Wei Xu, Jun Xu, Ling Chen, Kunji |
author_sort | Chen, Liangliang |
collection | PubMed |
description | To enable a-SiC(x):H-based memristors to be integrated into brain-inspired chips, and to efficiently deal with the massive and diverse data, high switching uniformity of the a-SiC(0.11):H memristor is urgently needed. In this study, we introduced a TiSbTe layer into an a-SiC(0.11):H memristor, and successfully observed the ultra-high uniformity of the TiSbTe/a-SiC(0.11):H memristor device. Compared with the a-SiC(0.11):H memristor, the cycle-to-cycle coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors was reduced by 92.5% and 66.4%, respectively. Moreover, the device-to-device coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors decreased by 93.6% and 86.3%, respectively. A high-resolution transmission electron microscope revealed that a permanent TiSbTe nanocrystalline conductive nanofilament was formed in the TiSbTe layer during the DC sweeping process. The localized electric field of the TiSbTe nanocrystalline was beneficial for confining the position of the conductive filaments in the a-SiC(0.11):H film, which contributed to improving the uniformity of the device. The temperature-dependent I-V characteristic further confirmed that the bridge and rupture of the Si dangling bond nanopathway was responsible for the resistive switching of the TiSbTe/a-SiC(0.11):H device. The ultra-high uniformity of the TiSbTe/a-SiC(0.11):H device ensured the successful implementation of biosynaptic functions such as spike-duration-dependent plasticity, long-term potentiation, long-term depression, and spike-timing-dependent plasticity. Furthermore, visual learning capability could be simulated through changing the conductance of the TiSbTe/a-SiC(0.11):H device. Our discovery of the ultra-high uniformity of TiSbTe/a-SiC(0.11):H memristor devices provides an avenue for their integration into the next generation of AI chips. |
format | Online Article Text |
id | pubmed-9227692 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-92276922022-06-25 Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing Chen, Liangliang Ma, Zhongyuan Leng, Kangmin Chen, Tong Hu, Hongsheng Yang, Yang Li, Wei Xu, Jun Xu, Ling Chen, Kunji Nanomaterials (Basel) Article To enable a-SiC(x):H-based memristors to be integrated into brain-inspired chips, and to efficiently deal with the massive and diverse data, high switching uniformity of the a-SiC(0.11):H memristor is urgently needed. In this study, we introduced a TiSbTe layer into an a-SiC(0.11):H memristor, and successfully observed the ultra-high uniformity of the TiSbTe/a-SiC(0.11):H memristor device. Compared with the a-SiC(0.11):H memristor, the cycle-to-cycle coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors was reduced by 92.5% and 66.4%, respectively. Moreover, the device-to-device coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors decreased by 93.6% and 86.3%, respectively. A high-resolution transmission electron microscope revealed that a permanent TiSbTe nanocrystalline conductive nanofilament was formed in the TiSbTe layer during the DC sweeping process. The localized electric field of the TiSbTe nanocrystalline was beneficial for confining the position of the conductive filaments in the a-SiC(0.11):H film, which contributed to improving the uniformity of the device. The temperature-dependent I-V characteristic further confirmed that the bridge and rupture of the Si dangling bond nanopathway was responsible for the resistive switching of the TiSbTe/a-SiC(0.11):H device. The ultra-high uniformity of the TiSbTe/a-SiC(0.11):H device ensured the successful implementation of biosynaptic functions such as spike-duration-dependent plasticity, long-term potentiation, long-term depression, and spike-timing-dependent plasticity. Furthermore, visual learning capability could be simulated through changing the conductance of the TiSbTe/a-SiC(0.11):H device. Our discovery of the ultra-high uniformity of TiSbTe/a-SiC(0.11):H memristor devices provides an avenue for their integration into the next generation of AI chips. MDPI 2022-06-19 /pmc/articles/PMC9227692/ /pubmed/35745449 http://dx.doi.org/10.3390/nano12122110 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Chen, Liangliang Ma, Zhongyuan Leng, Kangmin Chen, Tong Hu, Hongsheng Yang, Yang Li, Wei Xu, Jun Xu, Ling Chen, Kunji Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing |
title | Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing |
title_full | Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing |
title_fullStr | Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing |
title_full_unstemmed | Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing |
title_short | Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing |
title_sort | artificial synapse consisted of tisbte/sic(x):h memristor with ultra-high uniformity for neuromorphic computing |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227692/ https://www.ncbi.nlm.nih.gov/pubmed/35745449 http://dx.doi.org/10.3390/nano12122110 |
work_keys_str_mv | AT chenliangliang artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT mazhongyuan artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT lengkangmin artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT chentong artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT huhongsheng artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT yangyang artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT liwei artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT xujun artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT xuling artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing AT chenkunji artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing |