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Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing

To enable a-SiC(x):H-based memristors to be integrated into brain-inspired chips, and to efficiently deal with the massive and diverse data, high switching uniformity of the a-SiC(0.11):H memristor is urgently needed. In this study, we introduced a TiSbTe layer into an a-SiC(0.11):H memristor, and s...

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Autores principales: Chen, Liangliang, Ma, Zhongyuan, Leng, Kangmin, Chen, Tong, Hu, Hongsheng, Yang, Yang, Li, Wei, Xu, Jun, Xu, Ling, Chen, Kunji
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227692/
https://www.ncbi.nlm.nih.gov/pubmed/35745449
http://dx.doi.org/10.3390/nano12122110
_version_ 1784734242208481280
author Chen, Liangliang
Ma, Zhongyuan
Leng, Kangmin
Chen, Tong
Hu, Hongsheng
Yang, Yang
Li, Wei
Xu, Jun
Xu, Ling
Chen, Kunji
author_facet Chen, Liangliang
Ma, Zhongyuan
Leng, Kangmin
Chen, Tong
Hu, Hongsheng
Yang, Yang
Li, Wei
Xu, Jun
Xu, Ling
Chen, Kunji
author_sort Chen, Liangliang
collection PubMed
description To enable a-SiC(x):H-based memristors to be integrated into brain-inspired chips, and to efficiently deal with the massive and diverse data, high switching uniformity of the a-SiC(0.11):H memristor is urgently needed. In this study, we introduced a TiSbTe layer into an a-SiC(0.11):H memristor, and successfully observed the ultra-high uniformity of the TiSbTe/a-SiC(0.11):H memristor device. Compared with the a-SiC(0.11):H memristor, the cycle-to-cycle coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors was reduced by 92.5% and 66.4%, respectively. Moreover, the device-to-device coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors decreased by 93.6% and 86.3%, respectively. A high-resolution transmission electron microscope revealed that a permanent TiSbTe nanocrystalline conductive nanofilament was formed in the TiSbTe layer during the DC sweeping process. The localized electric field of the TiSbTe nanocrystalline was beneficial for confining the position of the conductive filaments in the a-SiC(0.11):H film, which contributed to improving the uniformity of the device. The temperature-dependent I-V characteristic further confirmed that the bridge and rupture of the Si dangling bond nanopathway was responsible for the resistive switching of the TiSbTe/a-SiC(0.11):H device. The ultra-high uniformity of the TiSbTe/a-SiC(0.11):H device ensured the successful implementation of biosynaptic functions such as spike-duration-dependent plasticity, long-term potentiation, long-term depression, and spike-timing-dependent plasticity. Furthermore, visual learning capability could be simulated through changing the conductance of the TiSbTe/a-SiC(0.11):H device. Our discovery of the ultra-high uniformity of TiSbTe/a-SiC(0.11):H memristor devices provides an avenue for their integration into the next generation of AI chips.
format Online
Article
Text
id pubmed-9227692
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-92276922022-06-25 Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing Chen, Liangliang Ma, Zhongyuan Leng, Kangmin Chen, Tong Hu, Hongsheng Yang, Yang Li, Wei Xu, Jun Xu, Ling Chen, Kunji Nanomaterials (Basel) Article To enable a-SiC(x):H-based memristors to be integrated into brain-inspired chips, and to efficiently deal with the massive and diverse data, high switching uniformity of the a-SiC(0.11):H memristor is urgently needed. In this study, we introduced a TiSbTe layer into an a-SiC(0.11):H memristor, and successfully observed the ultra-high uniformity of the TiSbTe/a-SiC(0.11):H memristor device. Compared with the a-SiC(0.11):H memristor, the cycle-to-cycle coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors was reduced by 92.5% and 66.4%, respectively. Moreover, the device-to-device coefficient of variation in the high resistance state and the low resistance state of TiSbTe/a-SiC(0.11):H memristors decreased by 93.6% and 86.3%, respectively. A high-resolution transmission electron microscope revealed that a permanent TiSbTe nanocrystalline conductive nanofilament was formed in the TiSbTe layer during the DC sweeping process. The localized electric field of the TiSbTe nanocrystalline was beneficial for confining the position of the conductive filaments in the a-SiC(0.11):H film, which contributed to improving the uniformity of the device. The temperature-dependent I-V characteristic further confirmed that the bridge and rupture of the Si dangling bond nanopathway was responsible for the resistive switching of the TiSbTe/a-SiC(0.11):H device. The ultra-high uniformity of the TiSbTe/a-SiC(0.11):H device ensured the successful implementation of biosynaptic functions such as spike-duration-dependent plasticity, long-term potentiation, long-term depression, and spike-timing-dependent plasticity. Furthermore, visual learning capability could be simulated through changing the conductance of the TiSbTe/a-SiC(0.11):H device. Our discovery of the ultra-high uniformity of TiSbTe/a-SiC(0.11):H memristor devices provides an avenue for their integration into the next generation of AI chips. MDPI 2022-06-19 /pmc/articles/PMC9227692/ /pubmed/35745449 http://dx.doi.org/10.3390/nano12122110 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Chen, Liangliang
Ma, Zhongyuan
Leng, Kangmin
Chen, Tong
Hu, Hongsheng
Yang, Yang
Li, Wei
Xu, Jun
Xu, Ling
Chen, Kunji
Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
title Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
title_full Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
title_fullStr Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
title_full_unstemmed Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
title_short Artificial Synapse Consisted of TiSbTe/SiC(x):H Memristor with Ultra-high Uniformity for Neuromorphic Computing
title_sort artificial synapse consisted of tisbte/sic(x):h memristor with ultra-high uniformity for neuromorphic computing
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9227692/
https://www.ncbi.nlm.nih.gov/pubmed/35745449
http://dx.doi.org/10.3390/nano12122110
work_keys_str_mv AT chenliangliang artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT mazhongyuan artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT lengkangmin artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT chentong artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT huhongsheng artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT yangyang artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT liwei artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT xujun artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT xuling artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing
AT chenkunji artificialsynapseconsistedoftisbtesicxhmemristorwithultrahighuniformityforneuromorphiccomputing