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Role of Ambient Hydrogen in HiPIMS-ITO Film during Annealing Process in a Large Temperature Range
Indium tin oxide (ITO) thin films were prepared by high power impulse magnetron sputtering (HiPIMS) and annealed in hydrogen-containing forming gas to reduce the film resistivity. The film resistivity reduces by nearly an order of magnitude from 5.6 × 10(−3) Ω·cm for the as-deposited film to the low...
Autores principales: | Zhao, Ming-Jie, Zhang, Jin-Fa, Huang, Jie, Chen, Zuo-Zhu, Xie, An, Wu, Wan-Yu, Huang, Chien-Jung, Wuu, Dong-Sing, Lien, Shui-Yang, Zhu, Wen-Zhang |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9228352/ https://www.ncbi.nlm.nih.gov/pubmed/35745334 http://dx.doi.org/10.3390/nano12121995 |
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