Cargando…

Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)

In this work, we report the results of the compositional analysis of an aluminum gallium arsenide (AlGaAs) sample using the calibration-free laser-induced breakdown spectroscopy (CF-LIBS) technique. The AlGaAs sample was doped with three various concentrations of gallium (Ga), arsenic (As), and alum...

Descripción completa

Detalles Bibliográficos
Autores principales: Alrebdi, Tahani A., Fayyaz, Amir, Asghar, Haroon, Zaman, Asif, Asghar, Mamoon, Alkallas, Fatemah H., Hussain, Atif, Iqbal, Javed, Khan, Wilayat
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9229630/
https://www.ncbi.nlm.nih.gov/pubmed/35744877
http://dx.doi.org/10.3390/molecules27123754
_version_ 1784734797388578816
author Alrebdi, Tahani A.
Fayyaz, Amir
Asghar, Haroon
Zaman, Asif
Asghar, Mamoon
Alkallas, Fatemah H.
Hussain, Atif
Iqbal, Javed
Khan, Wilayat
author_facet Alrebdi, Tahani A.
Fayyaz, Amir
Asghar, Haroon
Zaman, Asif
Asghar, Mamoon
Alkallas, Fatemah H.
Hussain, Atif
Iqbal, Javed
Khan, Wilayat
author_sort Alrebdi, Tahani A.
collection PubMed
description In this work, we report the results of the compositional analysis of an aluminum gallium arsenide (AlGaAs) sample using the calibration-free laser-induced breakdown spectroscopy (CF-LIBS) technique. The AlGaAs sample was doped with three various concentrations of gallium (Ga), arsenic (As), and aluminum (Al), as reported by the manufacturer, and the CF-LIBS technique was employed to identify the doping concentration. A pulsed Q-switched Nd: YAG laser capable of delivering 200 and 400 mJ energy at 532 and 1064 nm, respectively, was focused on the target sample for ablation, and the resulting emission spectra were captured using a LIBS 2000+ spectrometer covering the spectral range from 200 to 720 nm. The emission spectra of the AlGaAs sample yielded spectral lines of Ga, As, and Al. These lines were further used to calculate the plasma parameters, including electron temperature and electron number density. The Boltzmann plot method was used to calculate the electron temperature, and the average electron temperature was found to be 5744 ± 500 K. Furthermore, the electron number density was calculated from the Stark-broadened line profile method, and the average number density was calculated to be 6.5 × 10(17) cm(−3). It is further observed that the plasma parameters including electron temperature and electron number density have an increasing trend with laser irradiance and a decreasing trend along the plume length up to 2 mm. Finally, the elemental concentrations in terms of weight percentage using the CF-LIBS method were calculated to be Ga: 94%, Al: 4.77% and As: 1.23% for sample-1; Ga: 95.63%, Al: 1.15% and As: 3.22% for sample-2; and Ga: 97.32%, Al: 0.69% and As: 1.99% for sample-3. The certified concentrations were Ga: 95%, Al: 3% and As: 2% for sample-1; Ga: 96.05%, Al: 1% and As: 2.95% for sample-2; and Ga: 97.32%, Al: 0.69% and As: 1.99% for sample-3. The concentrations measured by CF-LIBS showed good agreement with the certified values reported by the manufacturer. These findings suggest that the CF-LIBS technique opens up an avenue for the industrial application of LIBS, where quantitative/qualitative analysis of the material is highly desirable.
format Online
Article
Text
id pubmed-9229630
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-92296302022-06-25 Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS) Alrebdi, Tahani A. Fayyaz, Amir Asghar, Haroon Zaman, Asif Asghar, Mamoon Alkallas, Fatemah H. Hussain, Atif Iqbal, Javed Khan, Wilayat Molecules Article In this work, we report the results of the compositional analysis of an aluminum gallium arsenide (AlGaAs) sample using the calibration-free laser-induced breakdown spectroscopy (CF-LIBS) technique. The AlGaAs sample was doped with three various concentrations of gallium (Ga), arsenic (As), and aluminum (Al), as reported by the manufacturer, and the CF-LIBS technique was employed to identify the doping concentration. A pulsed Q-switched Nd: YAG laser capable of delivering 200 and 400 mJ energy at 532 and 1064 nm, respectively, was focused on the target sample for ablation, and the resulting emission spectra were captured using a LIBS 2000+ spectrometer covering the spectral range from 200 to 720 nm. The emission spectra of the AlGaAs sample yielded spectral lines of Ga, As, and Al. These lines were further used to calculate the plasma parameters, including electron temperature and electron number density. The Boltzmann plot method was used to calculate the electron temperature, and the average electron temperature was found to be 5744 ± 500 K. Furthermore, the electron number density was calculated from the Stark-broadened line profile method, and the average number density was calculated to be 6.5 × 10(17) cm(−3). It is further observed that the plasma parameters including electron temperature and electron number density have an increasing trend with laser irradiance and a decreasing trend along the plume length up to 2 mm. Finally, the elemental concentrations in terms of weight percentage using the CF-LIBS method were calculated to be Ga: 94%, Al: 4.77% and As: 1.23% for sample-1; Ga: 95.63%, Al: 1.15% and As: 3.22% for sample-2; and Ga: 97.32%, Al: 0.69% and As: 1.99% for sample-3. The certified concentrations were Ga: 95%, Al: 3% and As: 2% for sample-1; Ga: 96.05%, Al: 1% and As: 2.95% for sample-2; and Ga: 97.32%, Al: 0.69% and As: 1.99% for sample-3. The concentrations measured by CF-LIBS showed good agreement with the certified values reported by the manufacturer. These findings suggest that the CF-LIBS technique opens up an avenue for the industrial application of LIBS, where quantitative/qualitative analysis of the material is highly desirable. MDPI 2022-06-10 /pmc/articles/PMC9229630/ /pubmed/35744877 http://dx.doi.org/10.3390/molecules27123754 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Alrebdi, Tahani A.
Fayyaz, Amir
Asghar, Haroon
Zaman, Asif
Asghar, Mamoon
Alkallas, Fatemah H.
Hussain, Atif
Iqbal, Javed
Khan, Wilayat
Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)
title Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)
title_full Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)
title_fullStr Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)
title_full_unstemmed Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)
title_short Quantification of Aluminum Gallium Arsenide (AlGaAs) Wafer Plasma Using Calibration-Free Laser-Induced Breakdown Spectroscopy (CF-LIBS)
title_sort quantification of aluminum gallium arsenide (algaas) wafer plasma using calibration-free laser-induced breakdown spectroscopy (cf-libs)
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9229630/
https://www.ncbi.nlm.nih.gov/pubmed/35744877
http://dx.doi.org/10.3390/molecules27123754
work_keys_str_mv AT alrebditahania quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT fayyazamir quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT asgharharoon quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT zamanasif quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT asgharmamoon quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT alkallasfatemahh quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT hussainatif quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT iqbaljaved quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs
AT khanwilayat quantificationofaluminumgalliumarsenidealgaaswaferplasmausingcalibrationfreelaserinducedbreakdownspectroscopycflibs