Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thi...

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Detalles Bibliográficos
Autores principales: Michman, Elisheva, Oded, Meirav, Shenhar, Roy
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9231016/
https://www.ncbi.nlm.nih.gov/pubmed/35745955
http://dx.doi.org/10.3390/polym14122377

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9231016/
https://www.ncbi.nlm.nih.gov/pubmed/35745955
http://dx.doi.org/10.3390/polym14122377

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