Cargando…
Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature
The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thi...
Autores principales: | Michman, Elisheva, Oded, Meirav, Shenhar, Roy |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9231016/ https://www.ncbi.nlm.nih.gov/pubmed/35745955 http://dx.doi.org/10.3390/polym14122377 |
Ejemplares similares
-
Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement
por: Michman, Elisheva, et al.
Publicado: (2023) -
Assembly of Semiconductor Nanorods into Circular Arrangements Mediated by Block Copolymer Micelles
por: Muzaffar-Kawasma, Riham, et al.
Publicado: (2022) -
Direct Printing of Ultrathin Block Copolymer Film with Nano‐in‐Micro Pattern Structures
por: Park, Tae Wan, et al.
Publicado: (2023) -
Modulating Polymer Ultrathin Film Crystalline Fraction and Orientation with Nanoscale Curvature
por: Ruffino, Roberta, et al.
Publicado: (2023) -
Curvature-controlled delamination patterns of thin films on spherical substrates
por: Zhu, Liangliang, et al.
Publicado: (2021)