Carbon-dot doped, transfer-free, low-temperature, high mobility graphene using microwave plasma CVD

Microwave plasma chemical vapor deposition is a well-known method for low-temperature, large-area direct graphene growth on any insulating substrate without any catalysts. However, the quality has not been significantly better than other graphene synthesis methods such as thermal chemical vapor depo...

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Detalles Bibliográficos
Autores principales: Mewada, Ashmi, Vishwakarma, Riteshkumar, Zhu, Rucheng, Umeno, Masayoshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9288858/
https://www.ncbi.nlm.nih.gov/pubmed/35919180
http://dx.doi.org/10.1039/d2ra03274k

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9288858/
https://www.ncbi.nlm.nih.gov/pubmed/35919180
http://dx.doi.org/10.1039/d2ra03274k

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