Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning

In the frame of the nanoarchitectonic concept, the objective of this study was to develop simple and easy methods to ensure the preparation of polymorphic HfO(2) thin film materials (<200 nm) having the best balance of patterning potential, reproducibility and stability to be used in optical, sen...

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Detalles Bibliográficos
Autores principales: Proust, Vanessa, Kirscher, Quentin, Nguyen, Thi Kim Ngan, Obringer, Lisa, Ishii, Kento, Rault, Ludivine, Demange, Valérie, Berthebaud, David, Ohashi, Naoki, Uchikoshi, Tetsuo, Berling, Dominique, Soppera, Olivier, Grasset, Fabien
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9320788/
https://www.ncbi.nlm.nih.gov/pubmed/35889559
http://dx.doi.org/10.3390/nano12142334

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9320788/
https://www.ncbi.nlm.nih.gov/pubmed/35889559
http://dx.doi.org/10.3390/nano12142334

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