Nonlinear Effects of Pulsed Ion Beam in Ultra-High Resolution Material Removal

Ion beam sputtering is widely utilized in the area of ultra-high precision fabrication, coating, and discovering the microworld. A pulsed ion beam (PIB) can achieve higher material removal resolution while maintaining traditional ion beam removal performance and macro removal efficiency. In this pap...

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Detalles Bibliográficos
Autores principales: Xie, Lingbo, Tian, Ye, Shi, Feng, Song, Ci, Tie, Guipeng, Zhou, Gang, Shao, Jianda, Liu, Shijie
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9321010/
https://www.ncbi.nlm.nih.gov/pubmed/35888914
http://dx.doi.org/10.3390/mi13071097

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9321010/
https://www.ncbi.nlm.nih.gov/pubmed/35888914
http://dx.doi.org/10.3390/mi13071097

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