Optical characterization of deuterated silicon-rich nitride waveguides

Chemical vapor deposition-based growth techniques allow flexible design of complementary metal-oxide semiconductor (CMOS) compatible materials. Here, we report the deuterated silicon-rich nitride films grown using plasma-enhanced chemical vapor deposition. The linear and nonlinear properties of the...

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Detalles Bibliográficos
Autores principales: Chia, Xavier X., Chen, George F. R., Cao, Yanmei, Xing, Peng, Gao, Hongwei, Ng, Doris K. T., Tan, Dawn T. H.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9325772/
https://www.ncbi.nlm.nih.gov/pubmed/35882882
http://dx.doi.org/10.1038/s41598-022-16889-7

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9325772/
https://www.ncbi.nlm.nih.gov/pubmed/35882882
http://dx.doi.org/10.1038/s41598-022-16889-7

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