Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF(4)/H(2) Plasma Reactive-Ion Etching

[Image: see text] The process of deep texturization of the crystalline silicon surface is intimately related to its promising diverse applications, such as bactericidal surfaces for integrated lab-on-chip devices and absorptive optical layers (black silicon—BSi). Surface structuring by a maskless te...

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Detalles Bibliográficos
Autores principales: Ghezzi, Francesco, Pedroni, Matteo, Kovač, Janez, Causa, Federica, Cremona, Anna, Anderle, Mariano, Caniello, Roberto, Pietralunga, Silvia M., Vassallo, Espedito
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9330092/
https://www.ncbi.nlm.nih.gov/pubmed/35910127
http://dx.doi.org/10.1021/acsomega.2c02740

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9330092/
https://www.ncbi.nlm.nih.gov/pubmed/35910127
http://dx.doi.org/10.1021/acsomega.2c02740

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