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Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF(4)/H(2) Plasma Reactive-Ion Etching
[Image: see text] The process of deep texturization of the crystalline silicon surface is intimately related to its promising diverse applications, such as bactericidal surfaces for integrated lab-on-chip devices and absorptive optical layers (black silicon—BSi). Surface structuring by a maskless te...
| Autores principales: | , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2022
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9330092/ https://www.ncbi.nlm.nih.gov/pubmed/35910127 http://dx.doi.org/10.1021/acsomega.2c02740 |