Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process

In this study, we performed molecular dynamics (MD) simulations of the filling process of few-nanometer-wide trenches with various resist materials in ultraviolet nanoimprint lithography (UV-NIL) to identify the main molecular features necessary for a successful filling process. The 2- and 3-nm wide...

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Detalles Bibliográficos
Autores principales: Iwata, Jun, Ando, Tadashi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9331815/
https://www.ncbi.nlm.nih.gov/pubmed/35893522
http://dx.doi.org/10.3390/nano12152554

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9331815/
https://www.ncbi.nlm.nih.gov/pubmed/35893522
http://dx.doi.org/10.3390/nano12152554

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