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Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process
In this study, we performed molecular dynamics (MD) simulations of the filling process of few-nanometer-wide trenches with various resist materials in ultraviolet nanoimprint lithography (UV-NIL) to identify the main molecular features necessary for a successful filling process. The 2- and 3-nm wide...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2022
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9331815/ https://www.ncbi.nlm.nih.gov/pubmed/35893522 http://dx.doi.org/10.3390/nano12152554 |