Cargando…
W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication
This paper investigates the fabrication accuracy of the W-band SU-8 photoresist micromachined 4th order waveguide bandpass filters (BPF). The designed filter based on cylindrical resonators is excited in TM(010) mode. It is ideally suitable for the layered SU-8 micromachining process as the height o...
Autores principales: | , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9332807/ https://www.ncbi.nlm.nih.gov/pubmed/35898107 http://dx.doi.org/10.3390/s22155604 |
_version_ | 1784758739636584448 |
---|---|
author | Liu, Min Yang, Qian Zhang, Anxue Guo, Cheng Chen, Juan |
author_facet | Liu, Min Yang, Qian Zhang, Anxue Guo, Cheng Chen, Juan |
author_sort | Liu, Min |
collection | PubMed |
description | This paper investigates the fabrication accuracy of the W-band SU-8 photoresist micromachined 4th order waveguide bandpass filters (BPF). The designed filter based on cylindrical resonators is excited in TM(010) mode. It is ideally suitable for the layered SU-8 micromachining process as the height of the resonator is much smaller than one wavelength, the electromagnetic fields remain unchanged in the thickness direction. The filter is composed of three silver-coated SU-8 layers based on a double-layer overlay process. Excellent manufacturing tolerances can be controlled within 4 μm in the thickness direction, around 10 μm in double-layer stacking accuracy, and an average of 1° in vertical angle deviation. Various challenges encountered in the SU-8 process are investigated while corresponding general solutions are proposed for machining high-precision devices. The measured results show a return loss of 12.4 dB and a minimum insertion loss of 0.8 dB, which are in agreement with the simulated one. Stress and deformation analysis are also conducted to confirm the maximum pressure that the filter can withstand and maintain good transmission performance. |
format | Online Article Text |
id | pubmed-9332807 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-93328072022-07-29 W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication Liu, Min Yang, Qian Zhang, Anxue Guo, Cheng Chen, Juan Sensors (Basel) Article This paper investigates the fabrication accuracy of the W-band SU-8 photoresist micromachined 4th order waveguide bandpass filters (BPF). The designed filter based on cylindrical resonators is excited in TM(010) mode. It is ideally suitable for the layered SU-8 micromachining process as the height of the resonator is much smaller than one wavelength, the electromagnetic fields remain unchanged in the thickness direction. The filter is composed of three silver-coated SU-8 layers based on a double-layer overlay process. Excellent manufacturing tolerances can be controlled within 4 μm in the thickness direction, around 10 μm in double-layer stacking accuracy, and an average of 1° in vertical angle deviation. Various challenges encountered in the SU-8 process are investigated while corresponding general solutions are proposed for machining high-precision devices. The measured results show a return loss of 12.4 dB and a minimum insertion loss of 0.8 dB, which are in agreement with the simulated one. Stress and deformation analysis are also conducted to confirm the maximum pressure that the filter can withstand and maintain good transmission performance. MDPI 2022-07-27 /pmc/articles/PMC9332807/ /pubmed/35898107 http://dx.doi.org/10.3390/s22155604 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Liu, Min Yang, Qian Zhang, Anxue Guo, Cheng Chen, Juan W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication |
title | W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication |
title_full | W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication |
title_fullStr | W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication |
title_full_unstemmed | W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication |
title_short | W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication |
title_sort | w-band 4th order waveguide filter based on double layer su8 microfabrication |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9332807/ https://www.ncbi.nlm.nih.gov/pubmed/35898107 http://dx.doi.org/10.3390/s22155604 |
work_keys_str_mv | AT liumin wband4thorderwaveguidefilterbasedondoublelayersu8microfabrication AT yangqian wband4thorderwaveguidefilterbasedondoublelayersu8microfabrication AT zhanganxue wband4thorderwaveguidefilterbasedondoublelayersu8microfabrication AT guocheng wband4thorderwaveguidefilterbasedondoublelayersu8microfabrication AT chenjuan wband4thorderwaveguidefilterbasedondoublelayersu8microfabrication |