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Compensation of the Stress Gradient in Physical Vapor Deposited Al(1−x)Sc(x)N Films for Microelectromechanical Systems with Low Out-of-Plane Bending
Thin film through-thickness stress gradients produce out-of-plane bending in released microelectromechanical systems (MEMS) structures. We study the stress and stress gradient of Al(0.68)Sc(0.32)N thin films deposited directly on Si. We show that Al(0.68)Sc(0.32)N cantilever structures realized in f...
Autores principales: | Beaucejour, Rossiny, D’Agati, Michael, Kalyan, Kritank, Olsson, Roy H. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9394260/ https://www.ncbi.nlm.nih.gov/pubmed/35893167 http://dx.doi.org/10.3390/mi13081169 |
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