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Role of Nanoscale Roughness and Polarity in Odd–Even Effect of Self‐Assembled Monolayers
The dependency of substrate roughness on wetting properties of self‐assembled monolayers (SAMs) has been studied extensively, but most previous studies used limited selection of probing liquid and range of surface roughness. These studies disregarded the limit to observation of sub‐nanometer odd–eve...
Autores principales: | Du, Chuanshen, Wang, Zhengjia, Chen, Jiahao, Martin, Andrew, Raturi, Dhruv, Thuo, Martin |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9400998/ https://www.ncbi.nlm.nih.gov/pubmed/35580255 http://dx.doi.org/10.1002/anie.202205251 |
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