Formation of Nano-Fibrous Patterns on Aluminum Substrates via Photolithographic Fabrication of Electrospun Photosensitive Polyimide Fibrous Membranes

The formation of polymeric micro-patterns on various substrates via a photolithography procedure has been widely used in semiconductor fabrication. Standard polymer patterns are usually fabricated via photosensitive polymer varnishes, in which large amounts of potentially harmful solvents with weigh...

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Detalles Bibliográficos
Autores principales: Gao, Yan-shuang, Ren, Xi, Du, Xuan-zhe, Wang, Zhen-zhong, He, Zhi-bin, Yuan, Shun-qi, Pan, Zhen, Zhang, Yan, Zhi, Xin-xin, Liu, Jin-gang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9413137/
https://www.ncbi.nlm.nih.gov/pubmed/36014610
http://dx.doi.org/10.3390/nano12162745

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9413137/
https://www.ncbi.nlm.nih.gov/pubmed/36014610
http://dx.doi.org/10.3390/nano12162745

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