Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO(2)

As low-temperature plasma plays an important role in semiconductor manufacturing, plasma diagnostics have been widely employed to understand changes in plasma according to external control parameters, which has led to the achievement of appropriate plasma conditions normally termed the process windo...

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Detalles Bibliográficos
Autores principales: Lee, Youngseok, Kim, Sijun, Lee, Jangjae, Cho, Chulhee, Seong, Inho, You, Shinjae
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9413963/
https://www.ncbi.nlm.nih.gov/pubmed/36015787
http://dx.doi.org/10.3390/s22166029

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9413963/
https://www.ncbi.nlm.nih.gov/pubmed/36015787
http://dx.doi.org/10.3390/s22166029

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