Enhanced Electrical Properties of Copper Nitride Films Deposited via High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films. This study discusses the deposition of copper nitride thin films via HiP...

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Detalles Bibliográficos
Autores principales: Chen, Yin-Hung, Lee, Pei-Ing, Sakalley, Shikha, Wen, Chao-Kuang, Cheng, Wei-Chun, Sun, Hui, Chen, Sheng-Chi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9415204/
https://www.ncbi.nlm.nih.gov/pubmed/36014680
http://dx.doi.org/10.3390/nano12162814

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9415204/
https://www.ncbi.nlm.nih.gov/pubmed/36014680
http://dx.doi.org/10.3390/nano12162814

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