Confining the growth of mesoporous silica films into nanospaces: towards surface nanopatterning

The combination of lithographic methods and sol gel bottom-up techniques is a promising approach for nanopatterning substrates. The integration and scalable fabrication of such substrates are of great interest for the development of nanowire-based materials opening potentialities in new technologies...

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Detalles Bibliográficos
Autores principales: Soulé, Samantha, Moehl, Gilles E., Huang, Ruomeng, Noori, Yasir J., Kiang, Kian Shen, Kees de Groot, C. H., Beanland, Richard, Smith, David C., Hector, Andrew L.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417874/
https://www.ncbi.nlm.nih.gov/pubmed/36131765
http://dx.doi.org/10.1039/d1na00654a

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417874/
https://www.ncbi.nlm.nih.gov/pubmed/36131765
http://dx.doi.org/10.1039/d1na00654a

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