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Confining the growth of mesoporous silica films into nanospaces: towards surface nanopatterning

The combination of lithographic methods and sol gel bottom-up techniques is a promising approach for nanopatterning substrates. The integration and scalable fabrication of such substrates are of great interest for the development of nanowire-based materials opening potentialities in new technologies...

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Detalles Bibliográficos
Autores principales:	Soulé, Samantha, Moehl, Gilles E., Huang, Ruomeng, Noori, Yasir J., Kiang, Kian Shen, Kees de Groot, C. H., Beanland, Richard, Smith, David C., Hector, Andrew L.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	RSC 2022
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417874/ https://www.ncbi.nlm.nih.gov/pubmed/36131765 http://dx.doi.org/10.1039/d1na00654a

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