A planar ultraviolet objective lens for optical axis free imaging nanolithography by employing optical negative refraction

Lithography is one of the most key technologies for integrated circuit (IC) manufacturing and micro/nano-functional device fabrication, while the imaging objective lens plays one important role. Due to the curved surface of the conventional objective lens, the imaging field of view is limited and th...

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Detalles Bibliográficos
Autores principales: Kong, Weijie, Liu, Ling, Wang, Changtao, Pu, Mingbo, Gao, Ping, Liu, Kaipeng, Luo, Yunfei, Jin, Qijian, Zhao, Chengwei, Luo, Xiangang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417967/
https://www.ncbi.nlm.nih.gov/pubmed/36133413
http://dx.doi.org/10.1039/d1na00883h

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417967/
https://www.ncbi.nlm.nih.gov/pubmed/36133413
http://dx.doi.org/10.1039/d1na00883h

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