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Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate
Spatial control of the orientation of block copolymers (BCPs) in thin films offers enormous opportunities for practical nanolithography applications. In this study, we demonstrate the use of a substrate comprised of poly(4-acetoxystyrene) to spatially control interfacial interactions and block copol...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
RSC
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418028/ https://www.ncbi.nlm.nih.gov/pubmed/36133582 http://dx.doi.org/10.1039/c9na00095j |