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Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate

Spatial control of the orientation of block copolymers (BCPs) in thin films offers enormous opportunities for practical nanolithography applications. In this study, we demonstrate the use of a substrate comprised of poly(4-acetoxystyrene) to spatially control interfacial interactions and block copol...

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Detalles Bibliográficos
Autores principales:	Jiang, Zhen, Alam, Md Mahbub, Cheng, Han-Hao, Blakey, Idriss, Whittaker, Andrew K.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	RSC 2019
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418028/ https://www.ncbi.nlm.nih.gov/pubmed/36133582 http://dx.doi.org/10.1039/c9na00095j

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