Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking

Emergent technologies are required in the field of nanoelectronics for improved contacts and interconnects at nano and micro-scale. In this work, we report a highly-efficient nanolithography process for the growth of cobalt nanostructures requiring an ultra-low charge dose (15 μC cm(−2), unprecedent...

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Detalles Bibliográficos
Autores principales: Salvador-Porroche, Alba, Sangiao, Soraya, Magén, César, Barrado, Mariano, Philipp, Patrick, Belotcerkovtceva, Daria, Kamalakar, M. Venkata, Cea, Pilar, De Teresa, José María
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418482/
https://www.ncbi.nlm.nih.gov/pubmed/36133267
http://dx.doi.org/10.1039/d1na00580d

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418482/
https://www.ncbi.nlm.nih.gov/pubmed/36133267
http://dx.doi.org/10.1039/d1na00580d

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