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Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking

Emergent technologies are required in the field of nanoelectronics for improved contacts and interconnects at nano and micro-scale. In this work, we report a highly-efficient nanolithography process for the growth of cobalt nanostructures requiring an ultra-low charge dose (15 μC cm(−2), unprecedent...

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Autores principales: Salvador-Porroche, Alba, Sangiao, Soraya, Magén, César, Barrado, Mariano, Philipp, Patrick, Belotcerkovtceva, Daria, Kamalakar, M. Venkata, Cea, Pilar, De Teresa, José María
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418482/
https://www.ncbi.nlm.nih.gov/pubmed/36133267
http://dx.doi.org/10.1039/d1na00580d
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author Salvador-Porroche, Alba
Sangiao, Soraya
Magén, César
Barrado, Mariano
Philipp, Patrick
Belotcerkovtceva, Daria
Kamalakar, M. Venkata
Cea, Pilar
De Teresa, José María
author_facet Salvador-Porroche, Alba
Sangiao, Soraya
Magén, César
Barrado, Mariano
Philipp, Patrick
Belotcerkovtceva, Daria
Kamalakar, M. Venkata
Cea, Pilar
De Teresa, José María
author_sort Salvador-Porroche, Alba
collection PubMed
description Emergent technologies are required in the field of nanoelectronics for improved contacts and interconnects at nano and micro-scale. In this work, we report a highly-efficient nanolithography process for the growth of cobalt nanostructures requiring an ultra-low charge dose (15 μC cm(−2), unprecedented in single-step charge-based nanopatterning). This resist-free process consists in the condensation of a ∼28 nm-thick Co(2)(CO)(8) layer on a substrate held at −100 °C, its irradiation with a Ga(+) focused ion beam, and substrate heating up to room temperature. The resulting cobalt-based deposits exhibit sub-100 nm lateral resolution, display metallic behaviour (room-temperature resistivity of 200 μΩ cm), present ferromagnetic properties (magnetization at room temperature of 400 emu cm(−3)) and can be grown in large areas. To put these results in perspective, similar properties can be achieved by room-temperature focused ion beam induced deposition and the same precursor only if a 2 × 10(3) times higher charge dose is used. We demonstrate the application of such an ultra-fast growth process to directly create electrical contacts onto graphene ribbons, opening the route for a broad application of this technology to any 2D material. In addition, the application of these cryo-deposits for hard masking is demonstrated, confirming its structural functionality.
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spelling pubmed-94184822022-09-20 Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking Salvador-Porroche, Alba Sangiao, Soraya Magén, César Barrado, Mariano Philipp, Patrick Belotcerkovtceva, Daria Kamalakar, M. Venkata Cea, Pilar De Teresa, José María Nanoscale Adv Chemistry Emergent technologies are required in the field of nanoelectronics for improved contacts and interconnects at nano and micro-scale. In this work, we report a highly-efficient nanolithography process for the growth of cobalt nanostructures requiring an ultra-low charge dose (15 μC cm(−2), unprecedented in single-step charge-based nanopatterning). This resist-free process consists in the condensation of a ∼28 nm-thick Co(2)(CO)(8) layer on a substrate held at −100 °C, its irradiation with a Ga(+) focused ion beam, and substrate heating up to room temperature. The resulting cobalt-based deposits exhibit sub-100 nm lateral resolution, display metallic behaviour (room-temperature resistivity of 200 μΩ cm), present ferromagnetic properties (magnetization at room temperature of 400 emu cm(−3)) and can be grown in large areas. To put these results in perspective, similar properties can be achieved by room-temperature focused ion beam induced deposition and the same precursor only if a 2 × 10(3) times higher charge dose is used. We demonstrate the application of such an ultra-fast growth process to directly create electrical contacts onto graphene ribbons, opening the route for a broad application of this technology to any 2D material. In addition, the application of these cryo-deposits for hard masking is demonstrated, confirming its structural functionality. RSC 2021-08-25 /pmc/articles/PMC9418482/ /pubmed/36133267 http://dx.doi.org/10.1039/d1na00580d Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by/3.0/
spellingShingle Chemistry
Salvador-Porroche, Alba
Sangiao, Soraya
Magén, César
Barrado, Mariano
Philipp, Patrick
Belotcerkovtceva, Daria
Kamalakar, M. Venkata
Cea, Pilar
De Teresa, José María
Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
title Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
title_full Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
title_fullStr Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
title_full_unstemmed Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
title_short Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
title_sort highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: application to electrical contacts on graphene, magnetism and hard masking
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418482/
https://www.ncbi.nlm.nih.gov/pubmed/36133267
http://dx.doi.org/10.1039/d1na00580d
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