Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

We report a novel anisotropic process, termed plasma etching induced by temperature gradients (PE-TG), which we use to modify the 3D morphology of a hexagonally close-packed polystyrene sphere array. Specifically, we combined an isotropic oxygen plasma (generated by a plasma cleaner) and a vertical...

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Detalles Bibliográficos
Autores principales: Darvill, Daniel, Iarossi, Marzia, Abraham Ekeroth, Ricardo M., Hubarevich, Aliaksandr, Huang, Jian-An, De Angelis, Francesco
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2020
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419189/
https://www.ncbi.nlm.nih.gov/pubmed/36131733
http://dx.doi.org/10.1039/d0na00718h

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419189/
https://www.ncbi.nlm.nih.gov/pubmed/36131733
http://dx.doi.org/10.1039/d0na00718h

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