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Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients
We report a novel anisotropic process, termed plasma etching induced by temperature gradients (PE-TG), which we use to modify the 3D morphology of a hexagonally close-packed polystyrene sphere array. Specifically, we combined an isotropic oxygen plasma (generated by a plasma cleaner) and a vertical...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
RSC
2020
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419189/ https://www.ncbi.nlm.nih.gov/pubmed/36131733 http://dx.doi.org/10.1039/d0na00718h |