Acceptor defects in polycrystalline Ge layers evaluated using linear regression analysis

Polycrystalline Ge thin films have recently attracted renewed attention as a material for various electronic and optical devices. However, the difficulty in the Fermi level control of polycrystalline Ge films owing to their high density of defect-induced acceptors has limited their application in th...

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Detalles Bibliográficos
Autores principales: Imajo, Toshifumi, Ishiyama, Takamitsu, Nozawa, Koki, Suemasu, Takashi, Toko, Kaoru
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9440008/
https://www.ncbi.nlm.nih.gov/pubmed/36056074
http://dx.doi.org/10.1038/s41598-022-19221-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9440008/
https://www.ncbi.nlm.nih.gov/pubmed/36056074
http://dx.doi.org/10.1038/s41598-022-19221-5

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