Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process

Nanoimprint lithography (NIL) is suitable for achieving high uniformity and mass production. However, in conventional NIL, a stamp suitable for the substrate size is required to increase the substrate size. To address this issue, we fabricated nanostructures on a large-area substrate using step-and-...

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Detalles Bibliográficos
Autores principales: Ha, Yeonjoo, Lim, Hyungjun, Choi, Hak-jong, Lee, JaeJong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9457461/
https://www.ncbi.nlm.nih.gov/pubmed/36079417
http://dx.doi.org/10.3390/ma15176036

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9457461/
https://www.ncbi.nlm.nih.gov/pubmed/36079417
http://dx.doi.org/10.3390/ma15176036

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