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Preferential growth of (001)-oriented Bi(2)SiO(5) thin films deposited on (101)-oriented rutile substrates and their ferroelectric and dielectric properties
Ferroelectric thin films are important because of their great potential for use in various electric devices such as ferroelectric random-access memory. It was expected that Bi(2)SiO(5), a Si-containing ferroelectric material, would show improved ferroelectricity by targeting a film with the (001)-or...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9458711/ https://www.ncbi.nlm.nih.gov/pubmed/36076050 http://dx.doi.org/10.1038/s41598-022-19058-y |