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Preferential growth of (001)-oriented Bi(2)SiO(5) thin films deposited on (101)-oriented rutile substrates and their ferroelectric and dielectric properties

Ferroelectric thin films are important because of their great potential for use in various electric devices such as ferroelectric random-access memory. It was expected that Bi(2)SiO(5), a Si-containing ferroelectric material, would show improved ferroelectricity by targeting a film with the (001)-or...

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Detalles Bibliográficos
Autores principales: Kodera, Masanori, Ishihama, Keisuke, Shimizu, Takao, Funakubo, Hiroshi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9458711/
https://www.ncbi.nlm.nih.gov/pubmed/36076050
http://dx.doi.org/10.1038/s41598-022-19058-y