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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
As the analysis of complicated reaction chemistry in bulk plasma has become more important, especially in plasma processing, quantifying radical density is now in focus. For this work, appearance potential mass spectrometry (APMS) is widely used; however, the original APMS can produce large errors d...
Autores principales: | , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9460062/ https://www.ncbi.nlm.nih.gov/pubmed/36081045 http://dx.doi.org/10.3390/s22176589 |
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author | Cho, Chulhee Kim, Sijun Lee, Youngseok Jeong, Wonnyoung Seong, Inho Lee, Jangjae Choi, Minsu You, Yebin Lee, Sangho Lee, Jinho You, Shinjae |
author_facet | Cho, Chulhee Kim, Sijun Lee, Youngseok Jeong, Wonnyoung Seong, Inho Lee, Jangjae Choi, Minsu You, Yebin Lee, Sangho Lee, Jinho You, Shinjae |
author_sort | Cho, Chulhee |
collection | PubMed |
description | As the analysis of complicated reaction chemistry in bulk plasma has become more important, especially in plasma processing, quantifying radical density is now in focus. For this work, appearance potential mass spectrometry (APMS) is widely used; however, the original APMS can produce large errors depending on the fitting process, as the fitting range is not exactly defined. In this research, to reduce errors resulting from the fitting process of the original method, a new APMS approach that eliminates the fitting process is suggested. Comparing the neutral densities in He plasma between the conventional method and the new method, along with the real neutral density obtained using the ideal gas equation, confirmed that the proposed quantification approach can provide more accurate results. This research will contribute to improving the precision of plasma diagnosis and help elucidate the plasma etching process. |
format | Online Article Text |
id | pubmed-9460062 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-94600622022-09-10 Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma Cho, Chulhee Kim, Sijun Lee, Youngseok Jeong, Wonnyoung Seong, Inho Lee, Jangjae Choi, Minsu You, Yebin Lee, Sangho Lee, Jinho You, Shinjae Sensors (Basel) Article As the analysis of complicated reaction chemistry in bulk plasma has become more important, especially in plasma processing, quantifying radical density is now in focus. For this work, appearance potential mass spectrometry (APMS) is widely used; however, the original APMS can produce large errors depending on the fitting process, as the fitting range is not exactly defined. In this research, to reduce errors resulting from the fitting process of the original method, a new APMS approach that eliminates the fitting process is suggested. Comparing the neutral densities in He plasma between the conventional method and the new method, along with the real neutral density obtained using the ideal gas equation, confirmed that the proposed quantification approach can provide more accurate results. This research will contribute to improving the precision of plasma diagnosis and help elucidate the plasma etching process. MDPI 2022-08-31 /pmc/articles/PMC9460062/ /pubmed/36081045 http://dx.doi.org/10.3390/s22176589 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Cho, Chulhee Kim, Sijun Lee, Youngseok Jeong, Wonnyoung Seong, Inho Lee, Jangjae Choi, Minsu You, Yebin Lee, Sangho Lee, Jinho You, Shinjae Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma |
title | Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma |
title_full | Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma |
title_fullStr | Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma |
title_full_unstemmed | Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma |
title_short | Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma |
title_sort | refined appearance potential mass spectrometry for high precision radical density quantification in plasma |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9460062/ https://www.ncbi.nlm.nih.gov/pubmed/36081045 http://dx.doi.org/10.3390/s22176589 |
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