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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma

As the analysis of complicated reaction chemistry in bulk plasma has become more important, especially in plasma processing, quantifying radical density is now in focus. For this work, appearance potential mass spectrometry (APMS) is widely used; however, the original APMS can produce large errors d...

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Autores principales: Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Jeong, Wonnyoung, Seong, Inho, Lee, Jangjae, Choi, Minsu, You, Yebin, Lee, Sangho, Lee, Jinho, You, Shinjae
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9460062/
https://www.ncbi.nlm.nih.gov/pubmed/36081045
http://dx.doi.org/10.3390/s22176589
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author Cho, Chulhee
Kim, Sijun
Lee, Youngseok
Jeong, Wonnyoung
Seong, Inho
Lee, Jangjae
Choi, Minsu
You, Yebin
Lee, Sangho
Lee, Jinho
You, Shinjae
author_facet Cho, Chulhee
Kim, Sijun
Lee, Youngseok
Jeong, Wonnyoung
Seong, Inho
Lee, Jangjae
Choi, Minsu
You, Yebin
Lee, Sangho
Lee, Jinho
You, Shinjae
author_sort Cho, Chulhee
collection PubMed
description As the analysis of complicated reaction chemistry in bulk plasma has become more important, especially in plasma processing, quantifying radical density is now in focus. For this work, appearance potential mass spectrometry (APMS) is widely used; however, the original APMS can produce large errors depending on the fitting process, as the fitting range is not exactly defined. In this research, to reduce errors resulting from the fitting process of the original method, a new APMS approach that eliminates the fitting process is suggested. Comparing the neutral densities in He plasma between the conventional method and the new method, along with the real neutral density obtained using the ideal gas equation, confirmed that the proposed quantification approach can provide more accurate results. This research will contribute to improving the precision of plasma diagnosis and help elucidate the plasma etching process.
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spelling pubmed-94600622022-09-10 Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma Cho, Chulhee Kim, Sijun Lee, Youngseok Jeong, Wonnyoung Seong, Inho Lee, Jangjae Choi, Minsu You, Yebin Lee, Sangho Lee, Jinho You, Shinjae Sensors (Basel) Article As the analysis of complicated reaction chemistry in bulk plasma has become more important, especially in plasma processing, quantifying radical density is now in focus. For this work, appearance potential mass spectrometry (APMS) is widely used; however, the original APMS can produce large errors depending on the fitting process, as the fitting range is not exactly defined. In this research, to reduce errors resulting from the fitting process of the original method, a new APMS approach that eliminates the fitting process is suggested. Comparing the neutral densities in He plasma between the conventional method and the new method, along with the real neutral density obtained using the ideal gas equation, confirmed that the proposed quantification approach can provide more accurate results. This research will contribute to improving the precision of plasma diagnosis and help elucidate the plasma etching process. MDPI 2022-08-31 /pmc/articles/PMC9460062/ /pubmed/36081045 http://dx.doi.org/10.3390/s22176589 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Cho, Chulhee
Kim, Sijun
Lee, Youngseok
Jeong, Wonnyoung
Seong, Inho
Lee, Jangjae
Choi, Minsu
You, Yebin
Lee, Sangho
Lee, Jinho
You, Shinjae
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
title Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
title_full Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
title_fullStr Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
title_full_unstemmed Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
title_short Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
title_sort refined appearance potential mass spectrometry for high precision radical density quantification in plasma
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9460062/
https://www.ncbi.nlm.nih.gov/pubmed/36081045
http://dx.doi.org/10.3390/s22176589
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