Chemical deposition of Cu(2)O films with ultra-low resistivity: correlation with the defect landscape

Cuprous oxide (Cu(2)O) is a promising p-type semiconductor material for many applications. So far, the lowest resistivity values are obtained for films deposited by physical methods and/or at high temperatures (~1000 °C), limiting their mass integration. Here, Cu(2)O thin films with ultra-low resist...

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Detalles Bibliográficos
Autores principales: Sekkat, Abderrahime, Liedke, Maciej Oskar, Nguyen, Viet Huong, Butterling, Maik, Baiutti, Federico, Sirvent Veru, Juan de Dios, Weber, Matthieu, Rapenne, Laetitia, Bellet, Daniel, Chichignoud, Guy, Kaminski-Cachopo, Anne, Hirschmann, Eric, Wagner, Andreas, Muñoz-Rojas, David
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9463139/
https://www.ncbi.nlm.nih.gov/pubmed/36085298
http://dx.doi.org/10.1038/s41467-022-32943-4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9463139/
https://www.ncbi.nlm.nih.gov/pubmed/36085298
http://dx.doi.org/10.1038/s41467-022-32943-4

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