Fabrication of a 100 × 100 mm(2) nanometer-thick graphite pellicle for extreme ultraviolet lithography by a peel-off and camphor-supported transfer approach

An extreme ultraviolet (EUV) lithography pellicle is used to physically protect a mask from contaminants during the EUV exposure process and needs to have a high EUV transmittance. The EUV pellicle should be fabricated using a freestanding thin film with several tens of nanometer thickness in an are...

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Detalles Bibliográficos
Autores principales: Nam, Ki-Bong, Hu, Qicheng, Yeo, Jin-Ho, Kim, Mun Ja, Yoo, Ji-Beom
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9470056/
https://www.ncbi.nlm.nih.gov/pubmed/36133349
http://dx.doi.org/10.1039/d2na00488g

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9470056/
https://www.ncbi.nlm.nih.gov/pubmed/36133349
http://dx.doi.org/10.1039/d2na00488g

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