C-Axis Textured, 2–3 μm Thick Al(0.75)Sc(0.25)N Films Grown on Chemically Formed TiN/Ti Seeding Layers for MEMS Applications

A protocol for successfully depositing [001] textured, 2–3 µm thick films of Al(0.75)Sc(0.25)N, is proposed. The procedure relies on the fact that sputtered Ti is [001]-textured [Formula: see text]-phase (hcp). Diffusion of nitrogen ions into the α-Ti film during reactive sputtering of Al(0.75),Sc(0...

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Detalles Bibliográficos
Autores principales: Cohen, Asaf, Cohen, Hagai, Cohen, Sidney R., Khodorov, Sergey, Feldman, Yishay, Kossoy, Anna, Kaplan-Ashiri, Ifat, Frenkel, Anatoly, Wachtel, Ellen, Lubomirsky, Igor, Ehre, David
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9504120/
https://www.ncbi.nlm.nih.gov/pubmed/36146391
http://dx.doi.org/10.3390/s22187041

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9504120/
https://www.ncbi.nlm.nih.gov/pubmed/36146391
http://dx.doi.org/10.3390/s22187041

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