A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching

Nano-steps, as classical nano-geometric reference materials, are very important for calibrating measurements in the semiconductor industry; therefore, controlling the height of nano-steps is critical for ensuring accurate measurements. Accordingly, in this study nano-steps with heights of 1, 2, 3 an...

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Detalles Bibliográficos
Autores principales: Wang, Chenying, Li, Lei, Jing, Weixuan, Zhang, Yaxin, Wang, Song, Lin, Qijing, Xian, Dan, Mao, Qi, Zhang, Yijun, Duan, Duanzhi, Liu, Ming, Jiang, Zhuangde
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9506470/
https://www.ncbi.nlm.nih.gov/pubmed/36144077
http://dx.doi.org/10.3390/mi13091454

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9506470/
https://www.ncbi.nlm.nih.gov/pubmed/36144077
http://dx.doi.org/10.3390/mi13091454

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