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A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching

Nano-steps, as classical nano-geometric reference materials, are very important for calibrating measurements in the semiconductor industry; therefore, controlling the height of nano-steps is critical for ensuring accurate measurements. Accordingly, in this study nano-steps with heights of 1, 2, 3 an...

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Autores principales: Wang, Chenying, Li, Lei, Jing, Weixuan, Zhang, Yaxin, Wang, Song, Lin, Qijing, Xian, Dan, Mao, Qi, Zhang, Yijun, Duan, Duanzhi, Liu, Ming, Jiang, Zhuangde
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9506470/
https://www.ncbi.nlm.nih.gov/pubmed/36144077
http://dx.doi.org/10.3390/mi13091454
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author Wang, Chenying
Li, Lei
Jing, Weixuan
Zhang, Yaxin
Wang, Song
Lin, Qijing
Xian, Dan
Mao, Qi
Zhang, Yijun
Duan, Duanzhi
Liu, Ming
Jiang, Zhuangde
author_facet Wang, Chenying
Li, Lei
Jing, Weixuan
Zhang, Yaxin
Wang, Song
Lin, Qijing
Xian, Dan
Mao, Qi
Zhang, Yijun
Duan, Duanzhi
Liu, Ming
Jiang, Zhuangde
author_sort Wang, Chenying
collection PubMed
description Nano-steps, as classical nano-geometric reference materials, are very important for calibrating measurements in the semiconductor industry; therefore, controlling the height of nano-steps is critical for ensuring accurate measurements. Accordingly, in this study nano-steps with heights of 1, 2, 3 and 4 nm were fabricated with good morphology using atomic layer deposition (ALD) combined with wet etching. The roughness of the fabricated nano-steps was effectively controlled by utilizing the three-dimensional conformal ALD process. Moreover, the relationship between the surface roughness and the height was studied using a simulation-based analysis. Essentially, roughness control is crucial in fabricating nano-steps with a critical dimension of less than 5 nm. In this study, the minimum height of a nano-step that was successfully achieved by combining ALD and wet etching was 1 nm. Furthermore, the preconditions for quality assurance for a reference material and the influencing factors of the fabrication method were analyzed based on the 1 nm nano-step sample. Finally, the fabricated samples were used in time-dependent experiments to verify the optimal stability of the nano-steps as reference materials. This research is instructive to fabricate nano-geometric reference materials to within 5 nm in height, and the proposed method can be easily employed to manufacture wafer-sized step height reference materials, thus enabling its large-scale industrial application for in-line calibration in integrated circuit production lines.
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spelling pubmed-95064702022-09-24 A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching Wang, Chenying Li, Lei Jing, Weixuan Zhang, Yaxin Wang, Song Lin, Qijing Xian, Dan Mao, Qi Zhang, Yijun Duan, Duanzhi Liu, Ming Jiang, Zhuangde Micromachines (Basel) Article Nano-steps, as classical nano-geometric reference materials, are very important for calibrating measurements in the semiconductor industry; therefore, controlling the height of nano-steps is critical for ensuring accurate measurements. Accordingly, in this study nano-steps with heights of 1, 2, 3 and 4 nm were fabricated with good morphology using atomic layer deposition (ALD) combined with wet etching. The roughness of the fabricated nano-steps was effectively controlled by utilizing the three-dimensional conformal ALD process. Moreover, the relationship between the surface roughness and the height was studied using a simulation-based analysis. Essentially, roughness control is crucial in fabricating nano-steps with a critical dimension of less than 5 nm. In this study, the minimum height of a nano-step that was successfully achieved by combining ALD and wet etching was 1 nm. Furthermore, the preconditions for quality assurance for a reference material and the influencing factors of the fabrication method were analyzed based on the 1 nm nano-step sample. Finally, the fabricated samples were used in time-dependent experiments to verify the optimal stability of the nano-steps as reference materials. This research is instructive to fabricate nano-geometric reference materials to within 5 nm in height, and the proposed method can be easily employed to manufacture wafer-sized step height reference materials, thus enabling its large-scale industrial application for in-line calibration in integrated circuit production lines. MDPI 2022-09-02 /pmc/articles/PMC9506470/ /pubmed/36144077 http://dx.doi.org/10.3390/mi13091454 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Wang, Chenying
Li, Lei
Jing, Weixuan
Zhang, Yaxin
Wang, Song
Lin, Qijing
Xian, Dan
Mao, Qi
Zhang, Yijun
Duan, Duanzhi
Liu, Ming
Jiang, Zhuangde
A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
title A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
title_full A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
title_fullStr A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
title_full_unstemmed A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
title_short A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
title_sort study on the sub-5 nm nano-step height reference materials fabricated by atomic layer deposition combined with wet etching
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9506470/
https://www.ncbi.nlm.nih.gov/pubmed/36144077
http://dx.doi.org/10.3390/mi13091454
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